- 面议
参考价：
起订量：
X-Ray波带片
- 型号
- 参数
- 应用领域:综合
原子力显微镜，原子力拉曼，有机合成质谱仪，制备色谱，纳米红外光谱仪，扫描近场光学显微镜，电镜下原子力，微米级3D打印机，
八帆仪器设备（上海）有限公司是创建于2017年，是集测试测量、研发、生产、销售、服务为一体的高科技公司，亚太区总部位于中国上海。并在北京设立办事处。八帆仪器设备（上海）有限公司致力于代理和应用*成熟的测试测量仪器及技术，应用于材料，物理，光学，化学，生物等领域。同时与国内外研发机构合作研究开发高精密测试测量技术及设备定制。有各*机构的技术支持，汇集有行业的精英技术团队，负责产品及方案设计、生产制造、售前售后服务。
详细信息
X-Ray波带片高质量的X射线光学系统，具有经过验证的分辨率、效率和可靠性、低成本，适用于ptychography、STXM、TXM和相位对比成像的软X射线和硬X射线。
X-Ray波带片优势：
利用不同的金属（金或镍）可以提高一系列能量的效率。该图为从ANT波带片软件生成的图像。
高分辨率波带片可在大范围的能量范围内提供z高的分辨率和效率。18 nm（Δr）分辨率的波带片提供高分辨率，水窗效率高于20％。18 nm Au FZP图像，直径270μm，中心光阑设计。
Applied Nanotool的波带片可用于各种应用，包括大直径的ptychography和几毫米的<1 nm缝合误差。直径为0.85毫米的波带片图像
高相位对比成像，适用于分辨率为50 nm及以下的硬X射线应用。波带片的均匀性是高相位衬度成像的关键组成部份。软X-Ray指标
低于5keV(<0.25nm)的X射线通常被归类为软X射线，该射线比高能X射线更容易被吸收。通常，波带片不需要相同的厚度效率，并且允许更高分辨率成像。软/细X射线的一系列波带板选项可满足特定要求。
| Device | Outer Zone Width ΔR n(nm) | Thickness (µm) | Outer Diameter (µm) | (# of zones) E/ΔE Limit | ~ Focal Length (µm) | Estimated Lead Time |
|---|---|---|---|---|---|---|
| NZP-50um-12nm | 12 | 0.05 + 0.01 | 50 | 1059 | 144 | Please Contact |
| NZP-65um-15nm | 15 | 65 | 1096 | 235 | ||
| SZP?90um?15nm | 15 | <0.1 | 90 | 1514 | 325 | 2-3 |
| SZP?120um?15nm | 120 | 2019 | 433 | |||
| SZP?200um?18nm | 18 | <0.15 | 200 | 2797 | 868 | In Stock |
| SZP?270um?18nm | 270 | 3775 | 1172 | |||
| SZP?320um?18nm | 320 | 4473 | 1389 | |||
| SZP-200um-25nm | 25 | <0.24 | 200 | 2007 | 1207 | In Stock |
| SZP?250um?25nm | 250 | 2509 | 1510 | |||
| SZP-300um-25nm | 300 | 3010 | 1811 | |||
| SZP-360um-25nm | 360 | 3612 | 2173 | |||
| TZP?160um?50nm | 50 | <0.75 | 160 | 801 | 1934 | 2 – 3 |
| TZP?280um?50nm | 280 | 1401 | 3384 | |||
| TZP?750um?200nm | 200 | <0.75 | 750 | 938 | 36292 | 1 – 3 |
| TZP?1250um?200nm | 1250 | 1563 | 60487 | |||
| *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. | ||||||
硬X-Ray指标
高于5-10keV的X射线从柔弱转变为硬X射线，在那里它们能够更好地穿透样品以提供更好的成像。硬X射线菲涅耳波带片需要高纵横比功能，以便为5 keV以上的能量提供足够的效率和分辨率。我们目前的光学系统可根据所需的能量为亚25 nm – 100 nm成像提供超高分辨率。堆叠硬X射线（通过双重处理或芯片对准）可以显着提高我们设备的效率。 硬X射线的波带片选项范围可用于特定要求。
| Device | Outer Zone Width ΔR n(nm) | Thickness (µm) | Outer Diameter (µm) | (# of zones) E/ΔE Limit | Energy Range (keV) | Estimated Lead Time (months) |
|---|---|---|---|---|---|---|
| HZP-50-25nm | 25 | >0.65 | 50 | 500 | 1.5 to 10 | 2 – 3 |
| HZP-75-25nm | 75 | 750 | 2 – 3 | |||
| HZP?100um?42.5nm | 42.5 | >0.8 | 100 | 588 | 2 to 12 | 2 – 3 |
| HZP?85um?50nm | 50 | >0.9 | 85 | 425 | 2 to 12 | 2 – 3 |
| HZPX?85um?50nm | >1.7 | 5.5 to 20 | 4 – 6 | |||
| HZP?180um?50nm | >0.9 | 180 | 900 | 2 to 12 | 2 – 3 | |
| HZP?550um?50nm | >0.9 | 550 | 2750 | 2 to 12 | 2 – 3 | |
| HZPX?550um?50nm | >1.5 | 5.5 to 20 | 4 – 6 | |||
| HZP-400um-100nm | 100 | >1.2 | 400 | 1000 | 2.5 to 8 | 2 – 3 |
| HZPX?400um?100nm | >2.6 | 8 to 30 | 4 – 6 | |||
| HZP?400um?120nm | 120 | >1.5 | 400 | 834 | 5 to 25 | 2 – 3 |
| HZPX?400um?120nm | >2.6 | 8 to 30 | 4 – 5 | |||
| HZP?750um?200nm | 200 | >2.2 | 750 | 938 | 7 to 20 | 3 – 4 |
| HZPX?750um?200nm | 200 | >3.6 | 12 to 50 | 4 – 5 | ||
| *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. All zone plate diameters can be customized for specific setups. Standard frame sizes are 3 mm x 3 mm with SiN membranes (100 nm). | ||||||
Oxide Interlock process for Hard X-Ray Optics
Zone plate efficiency for binary zone plates requires high aspect ratio structures which can survive high flux imaging systems. The “Oxide Interlock” option creates small interconnecting channels between metal zone of silicon dioxide which is transparent to hard X-rays and does not swell or distort, even when not under vacuum. These have been shown to significantly increase the zone plate efficiency and lifetime.
Oxide Interlock process with silicon dioxide links between the gold zones, improving performance and lifetime of the zone plate optics. This comes standard on all hard X-ray optics. The silicon dioxide is highly transparent for hard X-rays.中心光阑
中心光阑和外光阑选项可以显著改善波带板成像，降低光学器件的0次级并提高其使用寿命。各种厚度可达3μm的芯片可用或大于10μm作为单独的芯片。 高分辨率18 nm外区菲涅耳波带片顶部电镀4μm厚中心止点
4 um thick central stop electroplated on top of Fresnel zone plate with high resolution 18 nm outer zonesCustom Designs and Frame Size
Custom designs and frame sizes can be developed for specific applications. We are able to fabricate devices down to 0.1 mm and below. Our standard frame sizes are 5 mm x 5 mm and membrane thickness can be down to 50 nm while the 100 nm thickness is ideal for energies above 5 keV. We also offer silicon carbide membranes for those requiring long-lifetime membranes.
Custom silicon nitride, silicon carbide or silicon membranes down to 0.9 mm half dimensions. Image above showing 1 cm x 1 cm (top), 5 mm x 5 mm (bottom left) and 0.9 mm x 5 mm chips.XY Stage for Zone Plates/Central Stop Alignment
Our custom XY stage allows micro-scale alignment of a central stop and zone plate and also allows for a possible blast-shield to be mounted. XY micrometer scale stage holder for central stop and zone plate alignment with blast shield<ｉｆｒａｍｅ allowfullscreen="true" frameborder="0" height="480" mozallowfullscreen="true" src="https://myhub.autodesk360.com/ue2c055fb/shares/public/SHabee1QT1a327cf2b7a3d447e23386eab43?mode=embed" style="box-sizing: border-box; margin: 0px; padding: 0px; border-width: 0px; border-style: initial; font-style: inherit; font-variant: inherit; font-weight: inherit; font-stretch: inherit; font-size: inherit; line-height: inherit; font-family: inherit;" webkitallowfullscreen="true" width="640">
波带片计算器
Applied Nanotools offers a free online zone plate calculating theoretical efficiencies and for calculating Fresnel zone plates parameters. Please see this link to visit the webpage: Zone Plate Calculator. For the legacy software please download here (note, this version is being replaced with the new website version).
优势
利用不同的金属（金或镍）可以提高一系列能量的效率。该图为从ANT波带片软件生成的图像。 高分辨率波带片可在大范围的能量范围内提供高的分辨率和效率。18 nm（Δr）分辨率的波带片提供高分辨率，水窗效率高于20％。18 nm Au FZP图像，直径270μm，中心光阑设计。 Applied Nanotool的波带片可用于各种应用，包括大直径的ptychography和几毫米的<1 nm缝合误差。直径为0.85毫米的波带片图像 高相位对比成像，适用于分辨率为50 nm及以下的硬X射线应用。波带片的均匀性是高相位衬度成像的关键组成部份。软X-Ray指标
低于5keV(<0.25nm)的X射线通常被归类为软X射线，该射线比高能X射线更容易被吸收。通常，波带片不需要相同的厚度效率，并且允许更高分辨率成像。软/细X射线的一系列波带板选项可满足特定要求。
| Device | Outer Zone Width ΔR n(nm) | Thickness (µm) | Outer Diameter (µm) | (# of zones) E/ΔE Limit | ~ Focal Length (µm) | Estimated Lead Time |
|---|---|---|---|---|---|---|
| NZP-50um-12nm | 12 | 0.05 + 0.01 | 50 | 1059 | 144 | Please Contact |
| NZP-65um-15nm | 15 | 65 | 1096 | 235 | ||
| SZP?90um?15nm | 15 | <0.1 | 90 | 1514 | 325 | 2-3 |
| SZP?120um?15nm | 120 | 2019 | 433 | |||
| SZP?200um?18nm | 18 | <0.15 | 200 | 2797 | 868 | In Stock |
| SZP?270um?18nm | 270 | 3775 | 1172 | |||
| SZP?320um?18nm | 320 | 4473 | 1389 | |||
| SZP-200um-25nm | 25 | <0.24 | 200 | 2007 | 1207 | In Stock |
| SZP?250um?25nm | 250 | 2509 | 1510 | |||
| SZP-300um-25nm | 300 | 3010 | 1811 | |||
| SZP-360um-25nm | 360 | 3612 | 2173 | |||
| TZP?160um?50nm | 50 | <0.75 | 160 | 801 | 1934 | 2 – 3 |
| TZP?280um?50nm | 280 | 1401 | 3384 | |||
| TZP?750um?200nm | 200 | <0.75 | 750 | 938 | 36292 | 1 – 3 |
| TZP?1250um?200nm | 1250 | 1563 | 60487 | |||
| *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. | ||||||
硬X-Ray指标
高于5-10keV的X射线从柔弱转变为硬X射线，在那里它们能够更好地穿透样品以提供更好的成像。硬X射线菲涅耳波带片需要高纵横比功能，以便为5 keV以上的能量提供足够的效率和分辨率。我们目前的光学系统可根据所需的能量为亚25 nm – 100 nm成像提供超高分辨率。堆叠硬X射线（通过双重处理或芯片对准）可以显着提高我们设备的效率。 硬X射线的波带片选项范围可用于特定要求。
| Device | Outer Zone Width ΔR n(nm) | Thickness (µm) | Outer Diameter (µm) | (# of zones) E/ΔE Limit | Energy Range (keV) | Estimated Lead Time (months) |
|---|---|---|---|---|---|---|
| HZP-50-25nm | 25 | >0.65 | 50 | 500 | 1.5 to 10 | 2 – 3 |
| HZP-75-25nm | 75 | 750 | 2 – 3 | |||
| HZP?100um?42.5nm | 42.5 | >0.8 | 100 | 588 | 2 to 12 | 2 – 3 |
| HZP?85um?50nm | 50 | >0.9 | 85 | 425 | 2 to 12 | 2 – 3 |
| HZPX?85um?50nm | >1.7 | 5.5 to 20 | 4 – 6 | |||
| HZP?180um?50nm | >0.9 | 180 | 900 | 2 to 12 | 2 – 3 | |
| HZP?550um?50nm | >0.9 | 550 | 2750 | 2 to 12 | 2 – 3 | |
| HZPX?550um?50nm | >1.5 | 5.5 to 20 | 4 – 6 | |||
| HZP-400um-100nm | 100 | >1.2 | 400 | 1000 | 2.5 to 8 | 2 – 3 |
| HZPX?400um?100nm | >2.6 | 8 to 30 | 4 – 6 | |||
| HZP?400um?120nm | 120 | >1.5 | 400 | 834 | 5 to 25 | 2 – 3 |
| HZPX?400um?120nm | >2.6 | 8 to 30 | 4 – 5 | |||
| HZP?750um?200nm | 200 | >2.2 | 750 | 938 | 7 to 20 | 3 – 4 |
| HZPX?750um?200nm | 200 | >3.6 | 12 to 50 | 4 – 5 | ||
| *For estimated efficiency of zone plate, please see generated graphs below or download our zone plate software. All zone plate diameters can be customized for specific setups. Standard frame sizes are 3 mm x 3 mm with SiN membranes (100 nm). | ||||||
Oxide Interlock process for Hard X-Ray Optics
Zone plate efficiency for binary zone plates requires high aspect ratio structures which can survive high flux imaging systems. The “Oxide Interlock” option creates small interconnecting channels between metal zone of silicon dioxide which is transparent to hard X-rays and does not swell or distort, even when not under vacuum. These have been shown to significantly increase the zone plate efficiency and lifetime.
Oxide Interlock process with silicon dioxide links between the gold zones, improving performance and lifetime of the zone plate optics. This comes standard on all hard X-ray optics. The silicon dioxide is highly transparent for hard X-rays.中心光阑
中心光阑和外光阑选项可以显著改善波带板成像，降低光学器件的0次级并提高其使用寿命。各种厚度可达3μm的芯片可用或大于10μm作为单独的芯片。 高分辨率18 nm外区菲涅耳波带片顶部电镀4μm厚中心止点 4 um thick central stop electroplated on top of Fresnel zone plate with high resolution 18 nm outer zonesCustom Designs and Frame Size
Custom designs and frame sizes can be developed for specific applications. We are able to fabricate devices down to 0.1 mm and below. Our standard frame sizes are 5 mm x 5 mm and membrane thickness can be down to 50 nm while the 100 nm thickness is ideal for energies above 5 keV. We also offer silicon carbide membranes for those requiring long-lifetime membranes.
Custom silicon nitride, silicon carbide or silicon membranes down to 0.9 mm half dimensions. Image above showing 1 cm x 1 cm (top), 5 mm x 5 mm (bottom left) and 0.9 mm x 5 mm chips.XY Stage for Zone Plates/Central Stop Alignment
Our custom XY stage allows micro-scale alignment of a central stop and zone plate and also allows for a possible blast-shield to be mounted. XY micrometer scale stage holder for central stop and zone plate alignment with blast shield<ｉｆｒａｍｅ allowfullscreen="true" frameborder="0" height="480" mozallowfullscreen="true" src="https://myhub.autodesk360.com/ue2c055fb/shares/public/SHabee1QT1a327cf2b7a3d447e23386eab43?mode=embed" style="box-sizing: border-box; margin: 0px; padding: 0px; border-width: 0px; border-style: initial; font-style: inherit; font-variant: inherit; font-weight: inherit; font-stretch: inherit; font-size: inherit; line-height: inherit; font-family: inherit;" webkitallowfullscreen="true" width="640">
波带片计算器
Applied Nanotools offers a free online zone plate calculating theoretical efficiencies and for calculating Fresnel zone plates parameters. Please see this link to visit the webpage: Zone Plate Calculator. For the legacy software please download here (note, this version is being replaced with the new website version).
