CVD铜基多层氮化硼薄膜(2*2)
CVD铜基多层氮化硼薄膜(2*2)
CVD铜基多层氮化硼薄膜(2*2)

CVD铜基多层氮化硼薄膜(2*2)

参考价: 面议

具体成交价以合同协议为准
2024-06-03 13:33:17
1265
属性:
供货周期:一周;
>
产品属性
供货周期
一周
关闭
上海巨纳科技有限公司

上海巨纳科技有限公司

中级会员7
收藏

组合推荐相似产品

产品简介

Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

详细介绍

Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Multilayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.

Properties of h-BN

Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Multilayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.

Properties of h-BN

上一篇:默克化学试剂有哪些? 下一篇:什么是干洗衣服?衣服干洗是用什么洗的呢
热线电话 在线询价
提示

请选择您要拨打的电话:

当前客户在线交流已关闭
请电话联系他 :