CMP Orbis 柜式化学机械研磨抛光设备简介：

The Orbis CMP system is a precision engineered, floor standing CMP tool ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum analytical capabilities and enhanced processing performance.

CMP Orbis 柜式化学机械研磨抛光设备特点：

l Multi use processing capability

l Low cost solution – high value results

l Advanced design configuration

l Flexible use of operation

l Consistent, reliable yields

l Enhanced ease of use

CMP Orbis