FEI/赛默飞 品牌
生产厂家厂商性质
上海市所在地
集成能谱场发射扫描电镜
面议赛默飞矿物参数自动定量分析系统
面议ESCALAB QXi X 射线光电子能谱仪微探针
面议Nexsa G2 表面分析系统
面议K-Alpha X 射线光电子能谱仪系统
面议Aquilos 2 Cryo FIB
面议Helios 5 Hydra DualBeam
面议200 kV冷冻透射电镜 Glacios 冷冻 TEM
面议300 kV冷冻透射电镜 Krios G4 Cryo-TEM
面议100 kV冷冻透射电镜 Tundra Cryo-TEM
面议高称度冷冻透射电镜 Talos F200C TEM
面议最深入的材料分析透射电镜 Talos F200X TEM
面议The Thermo Scientific Helios 5 Laser PFIB System combines the best-in-class monochromated Elstar Scanning Electron Microscopy (SEM) Column with a plasma focused ion beam (PFIB) and a femtosecond laser to produce a high-resolution imaging and analysis tool with in-situ ablation capability, offering unprecedented material removal rates for fast millimeter-scale characterization at nanometer resolution.
Key Features
Millimeter-scale cross sections with up to 15,000x faster material removal than a typical gallium focused ion beam.
The same coincident point for all 3 beams (SEM/PFIB/laser) enables accurate and repeatable cut placement and 3D characterization.
Includes non-conductive or ion-beam-sensitive samples.
High-quality gallium-free TEM and APT sample preparation and high-resolution imaging capabilities.
Acquire data for much larger volumes within a shorter amount of time.
Extraction of subsurface TEM lamella or chunks for 3D analysis.
No need to transfer samples between different instruments for imaging and cross-sectioning.
Specifications
Femtosecond-laser specifications | ||
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Laser integration |
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Laser Output | ||
First Harmonic |
| 1030 nm (IR) |
| <280 fs | |
Second Harmonic |
| 515 nm (green) |
| <300 fs | |
Optics | ||
Coincident point |
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Objective lens |
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Polarization |
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Repetition rate |
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Position accuracy |
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Protective shutter |
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Software |
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Safety |
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